- Zirconia ceramic particle reinforced molybdenum electrode
- Coated electrode
- Molybdenum weight
- Sputtering targets
- DMB Plate
- High Temperature Furnaces
- Molybdenum crucibles
- Mobdenum Rod
- Molybdenum Plate
- TZM Alloy、Mo-La Alloy
- Fabricated parts
- Tungsten Heavy Alloy
- Surface Coating
- Spraying target
- Bonding service
- CMC
- Molybdenum radiator assembly
- Molybdenum substrate
- Coated electrode
Sputtering targets
Kewei patented product (Patent No. ZL 200810104986.1)：Mo tube, Mo rotatable target
Sputtering is a new type of Physical Vapor Deposition (PVD) method.
Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc..
The sputtering is mainly used in: flat panel displays, coated glass industry (including architectural glass, automotive glass, optical glass and other films), thin-film solar, surface engineering (decorative & Tools), (magnetic, optical) recording medium Microelectronics car lights, decorative coating.
In the field of Rotatable Target, Kewei first proposed the monolithic tube target in the year 2009, which has been recognized by domestic and foreign customers. We can provide the following sizes according to the requirements of customers:
Planar target: single weight:≤260kg, purity:≥99.97%
Rotatable target: OD:Φ140-180mm;ID:Φ125-Φ135mm. length≤3300mm ,purity:≥99.97%
COA
| Mo content | The sum of the contents of other elements | Each element content |
|---|---|---|
| ≥99.97% | ≤0.03% | ≤0.001% |